1、Protecting Groups in Organic Synthesis,Nomenclature of Organic Compound-1,Nomenclature of Organic Compound-2,Nomenclature of Organic Compound-3,Abbreviation 1,Abbreviation 2,Abbreviation 3,Abbreviation 4,Abbreviation 5,Abbreviation 6,Abbreviation 7,Abbreviation 8,选择保护基的原则:,(1) 保护基的供应来源,包括经济程度。 (2) 保
2、护基团必须能容易进行保护,且保护效率高。 (3) 保护基的引入对化合物的结构论证不致增加过量的复杂性,如保护中忌讳产生新的手性中心。 (4) 保护以后的化合物必须承受的起以后进行的反应和后处理过程。 (5) 保护基以后的化合物对分离、纯化、各种层析技术要稳定。 (6) 保护基团在高度专一的条件下能选择性、高效率地被除去。 (7) 去保护过程的副产物和产物能容易被分离。呼之即来,挥之即去。切莫请神容易,送神难。,羟基的保护基,1). 酯类保护基 t-BuCO (Piv); PhCO; MeCO; ClCH2CO et al.90% Nicolaou, K. C.; Webber, S. E. S
3、ynthesis, 1986, 453,酯类保护基的除去(cleavage)碱性条件下水解, 水解能力: t-BuCO(Piv) PhCO MeCO ClCH2CO 常用的碱:K2CO3, NH3, NH2NH2, Et3N, i-Pr2NEt et al 去除Piv一般用较强的强碱体系,如 KOH/H2O, LiAlH4, DIBAL, KBHEt3,ClCH2CO的去除可以用硫脲,氨/甲醇,苯,吡啶水溶液,NH2CH2CH2SH, NH2CH2CH2NH2, PhNHCH2CH2NH2 等除去。,2). 硅醚保护基 硅醚保护基主要有:Me3Si (trimethylsilyl, TMS);
4、 Et3Si (triethylsilyl, TES); t-BuMe2Si (tert-butyldimethylsilyl, TBDMS or TBS)i-Pr3Si (triisopropylsilyl, TIPS)t-BuPh2Si (tert-butyldiphenylsilyl, TBDPS)酸水解相对稳定性: TMS(1) TES(64) TBDMS(20,000) TIPS(700,000) TBDPS (5,000,000)碱水解相对稳定性: TMS(1) TES(50) TBDMS = TBDPS (20,000) TIPS(100,000) 硅醚保护基的除去: (F-Si
5、 142 kcal/mol; O-Si 112 kcal/mol) 通常用 HF / CH3CN; TBAF / THF; HF.Py / CH3CN,TMS ether: TMSCl or TMSOTf in pyridine, NEt3, i-Pr2NEt, imidazole, DBU,TES ether: TESCl/Imid. DMAP; TESOTf / Py. or 2,6-dimethylpyridine,TBDMS ether: TBDMSCl / imid. / DMF; TBDMSOTf / 2,6-dimethylpyridine,TBDPS ether: BDPSCl
6、 / imid. / DMF, catalyst: DMAP, solvent: CH2Cl2,TIPS ether: TIPSCl / DMF / imidazole.,Cleavage,Cleavage,Cleavage,Cleavage,烷基醚类:,Me (甲基醚) reagent: MeI; (MeO)2SO2; MeOTf cleavage: TMSI/CH3Cl(CH2Cl or MeCN) or BBr3 / CH2Cl2 Bn (苄基醚) reagent: PhCH2Br or PhCH2Clcleavage: H2 / 10% Pd/C, Raney-Ni, Rh-Al2O3
7、; Li(Na)/NH3 PMB (对甲氧基苄基醚); DMB or DMPB (3,4-二甲氧基苄基醚)reagent: PMBCl; p-MeOC6H4CH2O-C(=NH)CCl3cleavage: DDQ, CAN Tr (三苯甲基醚) reagent: TrCl/Py/DMAP; TrOTf/2,6-dimethylpyridineclaevage: HCO2H-H2O; HCO2H-tert-BuOH; HCl/MeCN; Na/NH3 tert-butyl (叔丁基醚) reagent: isobutene/CH2Cl2; t-BuO-C(=NH)CCl3cleavage: HC
8、O2H; CF3CO2H; HBr-HOAc, FeCl3; TiCl4; TMSI allyl (烯丙基醚) reagent: Allyl bromidecleavage: t-BuOK/DMSO/NaOH,cleavage,烷氧基烷基醚:,MOM(甲氧基甲基醚) methoxymethyl ether MTM(甲硫基甲基醚) methylthiomethyl ether MEM(甲氧基乙氧基甲基醚) methoxyethoxymethyl ether BOM(苄氧基甲基醚) benzyloxymethyl ether SEM(三甲硅基乙氧基甲基醚) trimethylsilylethoxy
9、methyl etherreagents: RCl or RBr/NaH/THFcleavage: MOM HCl/THF/H2O(1:2:1); Lewis acid: Me3SiBr/CH2Cl2; Me2BBr/CH2Cl2MTM AgNO3/2,6-dimethylpyridine; HgCl2/CaCO3MEM ZnBr2/CH2Cl2;HBr/THF;TiCl4/CH2Cl2; MeBBr/CH2Cl2 BOM Na/NH3/EtOH, H2/Pd(OH)2/C;Raney-Ni/EtOH; BF3/PhSH/CH2Cl2SEM HCl/MeOH; Lewis acid; THP(
10、四氢吡喃) tetrahydropyrane ether reagents: DHP(3,4-dihydro-2H-pyran)cleavage: HOAc/THF/H2O (4:2:1),O,O-Acetals(缩醛和缩酮),Reagents:Acetone; benzaldehyde,cyclo-ketone Cleavage: Acid; Lewis acidSilylene derivatives(硅烯衍生物)DTBS (di-tert-butylsilylene)reagent: t-Bu2SiCl2/Et3N/HOBT/MeCN; (HOBT 1-hydroxybenzotriaz
11、ole)t-Bu2Si(OTf)2/2,6-dimethylpyridine/CH2Cl2 Cleavage: HF-Py/THF-Pyridine, rt,醛酮的保护:,O,O-acetals: 1,3-dioxalane (5-number ring) and 1,3-dioxane (6-number ring) Catalyst: p-TsOH, CSA, PPTs,Carboxylic acid:,1) Methyl esterReagent: MeOH/HCl; MeOH/TMSCl; MeOH/SOCl2; MeI/KHCO3Cleavage: LiOH, KOH, NaOH/M
12、eOH, THF,Carboxylic acid 3:,3) MOM (methoxymethyl), MEM (2-methoxyethoxymethyl), BOM (benzyloxymethyl), MTM (methylthiomethyl), SEM (2-trimethylsilyl ethoxymethyl) TCE (2,2,2-trichloroethyl)TMSE (2-trimethylsilylethyl)TsE (2-tosylethyl)Bn (benzyl)allyl (allyl) ester,Carboxylic acid 2,2) tert-butyl e
13、sterReagent: isobutene/H2SO4Cleavage: acetic acid/isopropanol; TFA/CH2Cl2,Amino group 1:,1) Boc (tert-butoxycarbonyl) Reagent: (Boc)2O; BocON (2-(tert- butoxycarbonyloxyimino)phenylacetonitrile) Cleavage: TFA; TFA/CH2Cl2,Amino group 2,2) Cbz (benzyloxycarbonyl) Bergman (1932)reagent: CbzCl / base cleavage: catalytic hydrogenation,Amino group 3:,3) Fmoc (9-fluorenylmethoxycarbonyl)reagent: Fmoc-Cl / NaHCO3 Cleavage: NH3, Et2NH, piperidine, morpholine,